The HXF is especially designed for sputtering of sensitive coatings. The fully automatic arc handling reduces the arc energy to less than 0.3 mj / kW. The HXF is electrically and mechanically compatible with the power supplies type HX and has an interface for the operation of pulse generators as well. The impressively compact power supply can be integrated or attached to the plasma chamber in any position. Efficient water cooling ensures the highest reliability even in non-air-conditioned rooms. In order to avoid condensation water, an external magnetic valve can be connected via the integrated temperature control. The output power can be increased up to 240 kW in parallel operation.